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A photoresist degumming agent composition containing single-phase phosphonium salt and its preparation method and application

Invention patent
Patent Name
A photoresist degumming agent composition containing single-phase phosphonium salt and its preparation method and application
Application No.
CN202610221337.8
Publication No.
CN122104350A
Publication Date
2026-05-29
Applicant
Xiangzhe Technology (Hubei) Co., LTD
Patent Type
Invention patent
Legal Status
The substantive examination came into effect on June 16, 2026. The invention patent application was published on May 29, 2026

Abstract

The present invention discloses a composition of a photoluminescent glue degumming agent containing double hand scale salt, its preparation method and...

Abstract Figure

A photoresist degumming agent composition containing single-phase phosphonium salt and its preparation method and application
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