Product Introduction

The two-component silicon wafer cleaner SWC-01 is composed of multiple surfactants and special additives, including the components SWC-01A and SWC-01B. This product features stable pH value and easy rinsing, and can efficiently remove impurities such as silicon powder, oil stains and metal ions remaining on the surface of silicon wafers.

Product features

• Cleaning performance: The components of the cleaning agent can quickly penetrate the surface of the silicon wafer and remove surface impurities through both chemical reactions and physical dispersion.
• Rinsing performance: The overflow of the rinsing tank can quickly remove the cleaning agent components carried by the silicon wafers, ensuring that no surfactants remain on the surface of the silicon wafers.
• Long-term stability: It can ensure the stability of the product for a long time during long-term cyclic operation.

Physical and chemical indicators

Usage method

It is recommended to use it in a volume ratio of SWC-01A/B = 2/1, and the normal operating temperature should be between 50 and 65℃. During use, if the cleaning effect declines, add the cleaning agent SWC-01A/B. The specific amount of addition should be determined based on the number of silicon wafers to be pre-cleaned.

Precautions

Avoid prolonged contact of the skin with the cleaning solution. If prolonged contact is necessary, wear acid and alkali resistant gloves. The cleaning solution is alkaline. The waste liquid after use must not be directly discharged into the sewer or natural water system. It should be transported to the wastewater treatment station for neutralization treatment before being discharged.

Storage and transportation

Store in a sealed container in a cool and dry place. The shelf life is one year.
2. The shelf life of the product is one year from the date of production.

Specification

25kg/1000kg or customer-customized packaging.